HIVAC F-­4 is a high-quality vacuum diffusion pump oil formulated for excellent performance in high-vacuum systems. It provides superior chemical resistance, oxidation stability, low vapor pressure, and long service life, making it suitable for semiconductor, coating, and scientific applications. It also ensures low vapor pressure and stable performance under high vacuum conditions.

• Oxidation Resistance - HIVAC F-4 maintains excellent chemical stability even at high temperatures. Its flash point reaches over 210°C, effectively preventing decomposition reactions caused by elevated temperatures. Compared to ordinary mineral oils, it reduces oxidation residues by over 80%, significantly reducing the risk of pump contamination.

  
  

• Thermal Stability - HIVAC F-4 has a wide operating temperature range and a pour point of -35°C, ensuring fluidity in low-temperature environments. It also resists cracking at high temperatures. Its high-temperature stability is over 40% improved compared to fatty acid ester diffusion pump fluids.

  
  

• Chemically Inert - This oil does not release oxidizing gases or produce acids, tars, or asphalt during operation. With a specific gravity of 1.065 g/cm³, it forms a stable protective film on system surfaces, reducing corrosion on metal components.

  
  

• Low Vapor Pressure - HIVAC F-4 has a kinematic viscosity of 37 mm²/s (25°C) and an extremely low vapor pressure, ensuring rapid volatilization even in high vacuum environments. Comparative tests show that its evaporation loss is over 70% lower than that of petroleum-based pump oils.

  
  

• Long Service Life - HIVAC F-4's chemical and thermal stability ensures a long service life. Test results show that after 1,500 hours of continuous operation, its oil performance remains above 90%, eliminating the need for frequent replacement.

• Vacuum Pump Industry - HIVAC F-4 is widely used in high-vacuum diffusion pumps, ensuring long-term stable operation at vacuum conditions of 10⁻⁶ Torr and higher. Its low vapor pressure reduces pump oil backflow, improves system vacuum purity, and ensures pump efficiency and stability over extended periods of use.

  
  

• Semiconductor Manufacturing - In semiconductor manufacturing, HIVAC F-4 is used in ion implantation, etching, and thin film deposition. Its high-temperature stability and low vapor pressure ensure a pure process environment and reduce impurity contamination. Tests have shown that using HIVAC F-4 increases semiconductor yield by 5-8%, meeting the industry's stringent requirements for high-vacuum environments.

  
  

• Thin-Film Coating - In optical coating and thin-film deposition processes, HIVAC F-4's chemical inertness prevents process chamber contamination by byproducts. Its low vapor pressure maintains a stable vacuum level, reducing film defects caused by oil evaporation. Practical applications have shown that coating processes using this oil have improved film uniformity by over 15%.

  
  

• Optics and Instruments - HIVAC F-4 provides long-lasting, stable lubrication and protection for vacuum systems in precision optical instruments and scientific research equipment. Its antioxidant properties prevent contamination of optical cavities and maintain stable light transmittance. Experimental verification shows that after long-term operation, system cleanliness is 30% higher than that of mineral oil systems, significantly improving the reliability and service life of precision instruments.