HIVAC-F-5 is a methylphenyl silicone fluid developed for use in high-vacuum systems where long-term stability and clean operation are required. In operation, it delivers smooth circulation and consistent viscosity behavior under continuous pumping, supporting stable vacuum generation without frequent oil changes.

• Oxidation Resistance - HIVAC-F-5 exhibits strong resistance to oxidative degradation under vacuum and elevated temperature conditions. In controlled thermal aging tests, fluid degradation remains minimal after prolonged exposure above 200 °C. This resistance helps prevent formation of gaseous byproducts that could compromise vacuum purity or pump efficiency.

  
  

• Thermal Stability - The fluid maintains stable physical properties during extended heating cycles. With viscosity measured at approximately 160 mm² per second at 25 °C, viscosity change remains limited after repeated high-temperature operation. This stability supports consistent pumping behavior and reduces performance drift during long process runs.

  
  

• Chemical Resistance - HIVAC-F-5 resists breakdown when exposed to reactive gases and chemical vapors commonly encountered in vacuum environments. Laboratory exposure tests show negligible chemical interaction, with no significant viscosity increase or discoloration. This resistance helps maintain system cleanliness and reduces contamination risk.

  
  

• Low Volatility - The formulation demonstrates low vapor pressure under operating conditions, minimizing vapor loss during high-vacuum operation. Reduced evaporation helps maintain stable vacuum levels and extends service intervals. This property supports long-term pump operation without frequent fluid replenishment.

  
  

• Clean Decomposition - When vacuum is broken during heating, HIVAC-F-5 does not produce acidic compounds, tars, or pitch-like residues. Analytical testing confirms clean thermal decomposition behavior. This characteristic helps preserve internal pump surfaces and supports cleaner restart conditions after shutdown.

• Semiconductor Processing - HIVAC-F-5 is used in diffusion pumps supporting semiconductor manufacturing equipment. Stable vacuum performance supports precise process control during wafer processing steps. Clean fluid behavior helps reduce contamination risk in sensitive fabrication environments.

  
  

• Vacuum Equipment - The fluid is applied in high-vacuum pump systems used in industrial and research equipment. Its low volatility and thermal stability support continuous operation at elevated temperatures. This contributes to reliable vacuum generation over extended duty cycles.

  
  

• Optical Systems - HIVAC-F-5 supports vacuum environments required for optical coating and component preparation. Stable pumping conditions help maintain consistent deposition environments. Clean operation supports high optical quality and reduced surface contamination.

  
  

• Aerospace Applications - In aerospace testing and component processing, the fluid is used in vacuum chambers requiring clean and stable operation. Resistance to oxidation and chemical attack supports reliable vacuum maintenance. This helps meet stringent performance requirements in aerospace environments.

  
  

• High-Vacuum Coating - HIVAC-F-5 is used in high-vacuum coating systems for thin-film deposition. Stable fluid properties support uniform vacuum conditions during coating cycles. This consistency helps improve coating repeatability and process reliability.