ShinEtsu CFN-293 is a fluorosilicone-based antifoam agent designed for extreme environments. It maintains defoaming performance under high temperatures, strong acids, and aggressive chemical systems, making it ideal for specialty chemical processing.

• Silicone Base - CFN-293 is engineered with a fluorosilicone backbone that maintains structural stability under harsh environments. Testing at 25 degrees Celsius shows a viscosity of around 800 square millimetres per second, supporting reliable antifoaming performance in conditions where traditional silicone agents fail.

  
  

• Surface Improve - The material enhances adhesion at the interface between liquids and solid fillers. Laboratory evaluations show improved bonding performance on inorganic fillers and organic resin surfaces, reducing the formation of foam caused by unstable wetting during chemical operations.

  
  

• Moisture Resist - CFN-293 delivers stable performance in high-humidity conditions due to its moisture-repellent characteristics. Tests on cured systems such as sealants, coatings, and composites demonstrate consistent durability when exposed to water and prolonged humidity in industrial environments.

  
  

• Thermal Stable - The fluorosilicone structure maintains functionality across wide temperature variations. Its specific gravity of approximately 1.10 and refractive index near 1.390 confirm a stable molecular framework capable of supporting effective defoaming in high-temperature processing lines without breakdown.

  
  

• Industrial Versatile - The material maintains inertness in contact with a broad range of industrial substances. Studies on composites, cables, adhesive systems, and electronic materials verify compatibility without causing deformation, swelling, or interference with curing mechanisms.

• Specialty Chemicals - ShinEtsu CFN-293 performs effectively in specialty chemical formulations that contain strong reactants or corrosive components. Foam control remains consistent during mixing, agitation, and reaction steps, supporting high process precision.

  
  

• High-Temp Processing - The product is widely used in high-temperature processing equipment such as reactors, heated recirculation systems, and thermal treatment lines. CFN-293 maintains continuous defoaming efficiency under elevated heat, ensuring stable operational throughput.

  
  

• Acidic Systems - The fluorosilicone composition supports long-term use in acidic process environments. Applications include acid-cleaning solutions, pickling lines, and acid-intensive production flows that require strong foam suppression to maintain fluid stability.

  
  

• Electronics Manufacturing - ShinEtsu CFN-293 is suited for electronics manufacturing where purity and low residue are required. It helps maintain stable fluid behavior in etching baths, coating lines, and high-precision chemical processing used for component fabrication.

  
  

• Industrial Cleaning - The product assists industrial cleaning systems by controlling foam in high-pressure wash units, detergent-heavy mixtures, and chemical-cleaning circuits. Stable foam suppression supports consistent spray patterns and overall cleaning efficiency.